Invention Grant
- Patent Title: Structure for recording medium
- Patent Title (中): 记录介质结构
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Application No.: US13425676Application Date: 2012-03-21
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Publication No.: US08377551B2Publication Date: 2013-02-19
- Inventor: Ryosuke Yamamoto , Hiroki Tanaka , Naoko Kihara , Toshiro Hiraoka
- Applicant: Ryosuke Yamamoto , Hiroki Tanaka , Naoko Kihara , Toshiro Hiraoka
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Nixon & Vanderhye, P.C.
- Main IPC: B32B7/06
- IPC: B32B7/06 ; B32B18/00 ; B32B27/06 ; B32B33/00

Abstract:
A structure includes a substrate, a first layer formed on the substrate, and a second layer formed on the first layer. The first layer is comprised of self-assembled monolayer and contains 4-(6-hydroxyhexyloxy)-4′-methoxybiphenyl. The second layer is obtained by micro-phase separation of a block copolymer containing a hydrophilic polymer comprised of polyethylene oxide and a hydrophobic polymer comprised of polymethacrylic acid containing azobenzene at the side chain. The second layer contains a cylinder phase with its long axis being oriented perpendicular to the substrate. The thickness T of the second layer is within a range of A≦T≦50 nm, where A is a phase separation period length satisfying 5 nm≦A≦50 nm.
Public/Granted literature
- US20120231213A1 STRUCTURE Public/Granted day:2012-09-13
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