Invention Grant
- Patent Title: Micro shutter device and method of manufacturing the same
- Patent Title (中): 微型快门装置及其制造方法
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Application No.: US12537743Application Date: 2009-08-07
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Publication No.: US08379284B2Publication Date: 2013-02-19
- Inventor: Che-heung Kim
- Applicant: Che-heung Kim
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2008-111005 20081110
- Main IPC: G02B26/02
- IPC: G02B26/02

Abstract:
A micro shutter device and a method of manufacturing the same are provided. A barrier is provided to define a unit pixel. Film actuators are formed within the unit pixel. The film actuators are configured to be bent in opposite directions to each other from a substrate so that light passing through the substrate from an external light source is blocked in a voltage non-applied state, and to be straightened perpendicularly to the substrate so that the light is transmitted upon voltage application. Accordingly, it is possible to increase the aperture ratio and thus improve the light efficiency. Furthermore, it is possible to reduce voltage necessary to drive the film actuators and thus increase the drive speed.
Public/Granted literature
- US20100118373A1 MICRO SHUTTER DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2010-05-13
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