Invention Grant
- Patent Title: Gas discharge laser line narrowing module
- Patent Title (中): 气体放电激光线变窄模块
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Application No.: US11173955Application Date: 2005-06-30
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Publication No.: US08379687B2Publication Date: 2013-02-19
- Inventor: Raymond F. Cybulski , Robert A. Bergstedt , William N. Partlo , Richard L. Sandstrom , Gon Wang
- Applicant: Raymond F. Cybulski , Robert A. Bergstedt , William N. Partlo , Richard L. Sandstrom , Gon Wang
- Applicant Address: US CA San Diego
- Assignee: Cymer, Inc.
- Current Assignee: Cymer, Inc.
- Current Assignee Address: US CA San Diego
- Agency: Cymer, Inc.
- Main IPC: H01S3/08
- IPC: H01S3/08

Abstract:
A line narrowed gas discharge laser system and method of operating same is disclosed which may comprise a dispersive center wavelength selective element; a beam expander comprising a plurality of refractive elements; a refractive element positioning mechanism positioning at least one of the refractive elements to modify an angle of incidence of a laser light beam on the dispersive center wavelength selection element; each of the dispersive center wavelength selection element and the beam expander being aligned with each other and with a housing containing at least the dispersive center wavelength selection element; a housing positioning mechanism positioning the housing with respect to an optical axis of the gas discharge laser system. The dispersive element may comprise a grating and the beam expander may comprise a plurality of prisms. The housing may contain the dispersive center wavelength selective element and the beam expander. The housing positioning element may comprise a position locking mechanism.
Public/Granted literature
- US20070002919A1 Gas discharge laser line narrowing module Public/Granted day:2007-01-04
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