Invention Grant
- Patent Title: Model parameter extracting apparatus and model parameter extracting program for semiconductor device model
- Patent Title (中): 模型参数提取装置和半导体器件模型的模型参数提取程序
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Application No.: US12613215Application Date: 2009-11-05
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Publication No.: US08380479B2Publication Date: 2013-02-19
- Inventor: Yuukichi Hatanaka
- Applicant: Yuukichi Hatanaka
- Applicant Address: JP Kanagawa
- Assignee: Renesas Electronics Corporation
- Current Assignee: Renesas Electronics Corporation
- Current Assignee Address: JP Kanagawa
- Agency: Foley & Lardner LLP
- Priority: JP2008-296576 20081120
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
A model parameter extracting apparatus includes: a binning processor for carrying out a binning process; and a model parameter extractor for extracting a model parameter for each of multiple bins formed by the binning process. The model parameter extractor extracts a first model parameter corresponding to a first end portion of a target bin. Based on the first model parameter, the model parameter extractor sets up a candidate for a second model parameter corresponding to a second end portion of the target bin. Subsequently, based on the first model parameter and the candidate for the second model parameter, the model parameter extractor finds a start-point-side gradient and an end-point-side gradient of a limited curve representing an electric characteristic of a semiconductor device. Then, based on a result of a comparison between the gradients, the model parameter extractor extracts the second model parameter.
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