Invention Grant
US08381160B2 Manufacturing method, manufacturing program and manufacturing system for semiconductor device 有权
半导体器件的制造方法,制造程序和制造系统

  • Patent Title: Manufacturing method, manufacturing program and manufacturing system for semiconductor device
  • Patent Title (中): 半导体器件的制造方法,制造程序和制造系统
  • Application No.: US13288247
    Application Date: 2011-11-03
  • Publication No.: US08381160B2
    Publication Date: 2013-02-19
  • Inventor: Kyoko Izuha
  • Applicant: Kyoko Izuha
  • Applicant Address: JP Tokyo
  • Assignee: Sony Corporation
  • Current Assignee: Sony Corporation
  • Current Assignee Address: JP Tokyo
  • Agency: SNR Denton US LLP
  • Priority: JP2008-013494 20080124
  • Main IPC: G06F17/50
  • IPC: G06F17/50
Manufacturing method, manufacturing program and manufacturing system for semiconductor device
Abstract:
A method of manufacturing a semiconductor device, including the steps of: acquiring information on a graphic composing a physical layout of a semiconductor integrated circuit; carrying out calculation for a transferred image in the physical layout; carrying out calculation for a signal delay based on the physical layout, and obtaining a wiring not meeting a specification having the signal delay previously set therein; and setting a portion into which a repeater is to be inserted based on at least one result of results obtained from the information on the graphic and calculation for the transferred image, respectively, with respect to the wiring not meeting the specification.
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