Invention Grant
- Patent Title: Method for manufacturing a self-aligned bevel for a write pole
- Patent Title (中): 用于制造用于写入极的自对准斜面的方法
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Application No.: US12777959Application Date: 2010-05-11
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Publication No.: US08381392B2Publication Date: 2013-02-26
- Inventor: Jie Zou , Kaizhong Gao
- Applicant: Jie Zou , Kaizhong Gao
- Applicant Address: US CA Cupertino
- Assignee: Seagate Technology LLC
- Current Assignee: Seagate Technology LLC
- Current Assignee Address: US CA Cupertino
- Agency: Westman, Champlin & Kelly, P.A.
- Agent Alan G. Rego
- Main IPC: G11B5/127
- IPC: G11B5/127 ; H04R31/00
Abstract:
A method, including depositing a layer of material onto a base portion of a wafer, is disclosed. The layer of material has a first surface adjacent the base portion. The method also includes depositing a pattern of masking material onto a portion of a second surface of the layer. Material from the layer of material that is unprotected by the pattern of masking material is removed from the layer of material. By removing such material a portion of the layer of material is suspended from the base portion.
Public/Granted literature
- US20110277316A1 SELF-ALIGNED BEVELS FOR WRITE POLES Public/Granted day:2011-11-17
Information query
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