Invention Grant
- Patent Title: Vaporizer and semiconductor processing system
- Patent Title (中): 汽化器和半导体加工系统
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Application No.: US11543086Application Date: 2006-10-05
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Publication No.: US08382903B2Publication Date: 2013-02-26
- Inventor: Tsuneyuki Okabe , Shigeyuki Okura , Kazuo Ujiie
- Applicant: Tsuneyuki Okabe , Shigeyuki Okura , Kazuo Ujiie
- Applicant Address: JP Tokyo JP Kawagoe
- Assignee: Tokyo Electron Limited,Soken-Industries
- Current Assignee: Tokyo Electron Limited,Soken-Industries
- Current Assignee Address: JP Tokyo JP Kawagoe
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2005-293966 20051006
- Main IPC: C23C16/00
- IPC: C23C16/00

Abstract:
A vaporizer for generating a process gas from a liquid material includes a container defining a process space of the vaporizer, and an injector having a spray port configured to spray the liquid material in an atomized state downward in the container. A lower block is disposed below the spray port inside the container such that a run-up space for the atomized liquid material is defined between the spray port and the lower block, and an annular space continuous to the run-up space is defined between an inner surface of the container and the lower block. First and second heaters are respectively provided to the container and the lower block, and configured to heat the atomized liquid material flowing through the annular space to generate the process gas. A gas delivery passage is connected to the container to output the process gas from the annular space.
Public/Granted literature
- US20070079760A1 Vaporizer and semiconductor processing system Public/Granted day:2007-04-12
Information query
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