Invention Grant
- Patent Title: Sputtering target, transparent conductive film and transparent electrode
-
Application No.: US12067465Application Date: 2006-09-14
-
Publication No.: US08383019B2Publication Date: 2013-02-26
- Inventor: Koki Yano , Kazuyoshi Inoue , Nobuo Tanaka
- Applicant: Koki Yano , Kazuyoshi Inoue , Tokie Tanaka
- Applicant Address: JP Tokyo
- Assignee: Idemitsu Kosan Co., Ltd.
- Current Assignee: Idemitsu Kosan Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Millen, White, Zelano & Branigan, P.C.
- Priority: JP2005-271658 20050920
- International Application: PCT/JP2006/318270 WO 20060914
- International Announcement: WO2007/034733 WO 20070329
- Main IPC: H01B1/08
- IPC: H01B1/08 ; C23C14/34 ; H01B5/14
Abstract:
A sputtering target including indium, tin, zinc and oxygen, and including a hexagonal layered compound, a spinel structure compound and a bixbyite structure compound.
Public/Granted literature
- US20110121244A1 SPUTTERING TARGET, TRANSPARENT CONDUCTIVE FILM AND TRANSPARENT ELECTRODE Public/Granted day:2011-05-26
Information query
