Invention Grant
- Patent Title: Methods of fabricating reticles with subdivided blocking regions
- Patent Title (中): 制造具有细分阻挡区域的掩模版的方法
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Application No.: US13305987Application Date: 2011-11-29
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Publication No.: US08383301B2Publication Date: 2013-02-26
- Inventor: J. Brett Rolfson
- Applicant: J. Brett Rolfson
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: TraskBritt
- Main IPC: G03F1/00
- IPC: G03F1/00 ; G03F1/40

Abstract:
Methods for designing, fabricating, and using attenuated phase shift reticles, or photomasks are disclosed. Methods are also disclosed for subdividing the radiation blocking regions of previously fabricated reticles of previously existing designs. The methods may include forming radiation blocking regions that are subdivided, by cut lines, into discrete, spaced apart sections with dimensions (e.g., surface area, etc.) configured to minimize or eliminate the buildup of electrostatic energy by the radiation blocking regions and/or the discharge of electrostatic energy from the radiation blocking regions and the damage that may be caused by such electrostatic discharge. The methods may include configuring the reticle to prevent radiation from passing through the cut lines between adjacent sections of a subdivided radiation blocking region.
Public/Granted literature
- US20120070768A1 RETICLES WITH SUBDIVIDED BLOCKING REGIONS AND METHODS OF FABRICATION Public/Granted day:2012-03-22
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