Invention Grant
- Patent Title: Lithographic apparatus and method
- Patent Title (中): 平版印刷设备和方法
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Application No.: US12553390Application Date: 2009-09-03
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Publication No.: US08383325B2Publication Date: 2013-02-26
- Inventor: Nikolay Nikolaevich Iosad , Cheng-Qun Gui
- Applicant: Nikolay Nikolaevich Iosad , Cheng-Qun Gui
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F7/26
Abstract:
A lithographic method includes providing particles in dry form on a substrate, or on material provided on the substrate, irradiating one or more of the particles with a dose of radiation, the dose of radiation being sufficient to ensure that at least one particle of the one or more particles is bonded to the substrate, or to the material provided on the substrate, and removing particles from the substrate, or from material provided on the substrate, that have not been bonded to the substrate, or to the material provided on the substrate.
Public/Granted literature
- US20100068416A1 LITHOGRAPHIC APPARATUS AND METHOD Public/Granted day:2010-03-18
Information query
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