Invention Grant
- Patent Title: Pattern exposure method and pattern exposure apparatus
- Patent Title (中): 图案曝光方法和图案曝光装置
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Application No.: US12066015Application Date: 2006-09-05
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Publication No.: US08383330B2Publication Date: 2013-02-26
- Inventor: Satoshi Mino , Takeshi Fujii , Norihisa Takada
- Applicant: Satoshi Mino , Takeshi Fujii , Norihisa Takada
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2005-259119 20050907; JP2005-260533 20050908
- International Application: PCT/JP2006/317946 WO 20060905
- International Announcement: WO2007/029852 WO 20070315
- Main IPC: G03C5/06
- IPC: G03C5/06

Abstract:
A belt-like work (11) provided with a photosensitive layer is conveyed in a work conveying direction F at a work conveying speed V. An illuminating section (30) illuminates a photomask (29) in an exposure period T synchronized with the work conveying speed V. The photomask (29) is disposed at a proximity gap from the belt-like work (11). Mask patterns (33) on the photomask (29) are exposed on the belt-like work (11) to form periodic patterns thereon.
Public/Granted literature
- US20090268186A1 PATTERN EXPOSURE METHOD AND PATTERN EXPOSURE APPARATUS Public/Granted day:2009-10-29
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