Invention Grant
- Patent Title: Deposition of photovoltaic thin films by plasma spray deposition
- Patent Title (中): 通过等离子喷涂沉积沉积光伏薄膜
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Application No.: US12716024Application Date: 2010-03-02
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Publication No.: US08383451B2Publication Date: 2013-02-26
- Inventor: Brian Josef Bartholomeusz , Michael Bartholomeusz
- Applicant: Brian Josef Bartholomeusz , Michael Bartholomeusz
- Applicant Address: US CA Sunnyvale
- Assignee: AQT Solar, Inc.
- Current Assignee: AQT Solar, Inc.
- Current Assignee Address: US CA Sunnyvale
- Agency: Mattingly & Malur PC
- Main IPC: H01L21/00
- IPC: H01L21/00
Abstract:
In particular embodiments, a method is described for depositing thin films, such as those used in forming a photovoltaic cell or device. In a particular embodiment, the method includes providing a substrate suitable for use in a photovoltaic device and plasma spraying one or more layers over the substrate, the grain size of the grains in each of the one or more layers being at least approximately two times greater than the thickness of the respective layer.
Public/Granted literature
- US20100224245A1 Deposition of Photovoltaic Thin Films by Plasma Spray Deposition Public/Granted day:2010-09-09
Information query
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