Invention Grant
- Patent Title: Solar cell and method for producing solar cell
- Patent Title (中): 太阳能电池及其制造方法
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Application No.: US11665015Application Date: 2005-10-13
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Publication No.: US08383930B2Publication Date: 2013-02-26
- Inventor: Takayuki Isaka , Yoshiya Abiko , Yoshifumi Tonomura
- Applicant: Takayuki Isaka , Yoshiya Abiko , Yoshifumi Tonomura
- Applicant Address: JP Osaka
- Assignee: Sharp Kabushiki Kaisha
- Current Assignee: Sharp Kabushiki Kaisha
- Current Assignee Address: JP Osaka
- Agency: Nixon & Vanderhye P.C.
- Priority: JP2004-312140 20041027
- International Application: PCT/JP2005/018847 WO 20051013
- International Announcement: WO2006/046407 WO 20060504
- Main IPC: H01L31/052
- IPC: H01L31/052 ; H01L31/0264 ; H01L31/18
Abstract:
Disclosed is a solar cell including a passivation film formed on a light-receiving surface of a silicon substrate, and an antireflection film formed on the passivation film, wherein the passivation film has a refractive index higher than that of the antireflection film. The passivation film and the antireflection film can each be made of a silicon nitride film.
Public/Granted literature
- US20090007966A1 Solar cell and method for producing solar cell Public/Granted day:2009-01-08
Information query
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