Invention Grant
- Patent Title: Non-planar thin fin transistor
- Patent Title (中): 非平面薄鳍晶体管
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Application No.: US13193363Application Date: 2011-07-28
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Publication No.: US08384142B2Publication Date: 2013-02-26
- Inventor: Werner Juengling
- Applicant: Werner Juengling
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Fletcher Yoder
- Main IPC: H01L27/108
- IPC: H01L27/108 ; H01L21/00 ; H01L21/8238

Abstract:
Methods for fabricating a non-planar transistor. Fin field effect transistors (finFETs) are often built around a fin (e.g., a tall, thin semiconductive member). During manufacturing, a fin may encounter various mechanical stresses, e.g., inertial forces during movement of the substrate and fluid forces during cleaning steps. If the forces on the fin are too large, the fin may fracture and possibly render a transistor inoperative. Supporting one side of a fin before forming the second side of a fin creates stability in the fin structure, thereby counteracting many of the mechanical stresses incurred during manufacturing.
Public/Granted literature
- US20110284960A1 NON-PLANAR THIN FIN TRANSISTOR Public/Granted day:2011-11-24
Information query
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