Invention Grant
US08384873B2 Drill for repairing point defect in liquid crystal device and method of manufacturing liquid crystal device 有权
用于液晶装置修补点缺陷的钻孔及液晶装置的制造方法

  • Patent Title: Drill for repairing point defect in liquid crystal device and method of manufacturing liquid crystal device
  • Patent Title (中): 用于液晶装置修补点缺陷的钻孔及液晶装置的制造方法
  • Application No.: US12602968
    Application Date: 2008-02-01
  • Publication No.: US08384873B2
    Publication Date: 2013-02-26
  • Inventor: Masaki Ikeda
  • Applicant: Masaki Ikeda
  • Applicant Address: JP Osaka
  • Assignee: Sharp Kabushiki Kaisha
  • Current Assignee: Sharp Kabushiki Kaisha
  • Current Assignee Address: JP Osaka
  • Agency: Birch, Stewart, Kolasch & Birch, LLP
  • Priority: JP2007-148328 20070604
  • International Application: PCT/JP2008/051639 WO 20080201
  • International Announcement: WO2008/149574 WO 20081211
  • Main IPC: G02F1/13
  • IPC: G02F1/13
Drill for repairing point defect in liquid crystal device and method of manufacturing liquid crystal device
Abstract:
A drill 40 for repairing a point defect in a liquid crystal device 10 in accordance with the present invention is the drill 40 for cutting the glass substrate 11 included in the liquid crystal device 10 so as to repair the point defect in the liquid crystal device 10. The drill 40 is characterized by having a point angle PA from 130 to 180 deg.
Information query
Patent Agency Ranking
0/0