Invention Grant
US08384874B2 Immersion exposure apparatus and device manufacturing method to detect if liquid on base member
有权
浸没式曝光装置和装置制造方法，用于检测底座上的液体
- Patent Title: Immersion exposure apparatus and device manufacturing method to detect if liquid on base member
- Patent Title (中): 浸没式曝光装置和装置制造方法，用于检测底座上的液体
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Application No.: US11632070Application Date: 2005-07-11
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Publication No.: US08384874B2Publication Date: 2013-02-26
- Inventor: Makoto Shibuta
- Applicant: Makoto Shibuta
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Miles and Stockbridge P.C.
- Priority: JPP2004-205009 20040712
- International Application: PCT/JP2005/012776 WO 20050711
- International Announcement: WO2006/006565 WO 20060119
- Main IPC: G03B27/52
- IPC: G03B27/52
Abstract:
An exposure apparatus which prevents the damage due to the liquid having flowed out from spreading and enables satisfactory performances of the exposure processes and the measurement processes is provided. An exposure apparatus (EX) includes a movable table (PT), a base member (41) having an upper surface (41A) that guides the movement of the table (PT), and a detecting device (60) that detects whether there is a liquid on the upper surface (41A) of the base member (41).
Public/Granted literature
- US20070182945A1 Exposure apparatus and device manufacturing method Public/Granted day:2007-08-09
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