Invention Grant
US08384879B2 Optical position sensor, a position sensitive detector, a lithographic apparatus and a method for determining an absolute position of a movable object to be used in a relative position measurement system
有权
光学位置传感器,位置敏感检测器,光刻设备和用于确定在相对位置测量系统中使用的可移动物体的绝对位置的方法
- Patent Title: Optical position sensor, a position sensitive detector, a lithographic apparatus and a method for determining an absolute position of a movable object to be used in a relative position measurement system
- Patent Title (中): 光学位置传感器,位置敏感检测器,光刻设备和用于确定在相对位置测量系统中使用的可移动物体的绝对位置的方法
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Application No.: US12499612Application Date: 2009-07-08
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Publication No.: US08384879B2Publication Date: 2013-02-26
- Inventor: Patrick David Vogelsang , Martinus Cornelis Reijnen , Tom Van Zutphen
- Applicant: Patrick David Vogelsang , Martinus Cornelis Reijnen , Tom Van Zutphen
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/42

Abstract:
A sensor includes a semiconductor body having a top and bottom surface, a first doped surface oriented region of a first conductivity type at the top surface, and a second doped surface oriented region of a second and opposite conductivity type at the bottom surface, wherein a sensitive area is defined where the first region overlaps with the second region. A resistive layer is partially arranged in the sensitive area. The sensor includes two first electrode contacts and two second electrode contacts, wherein the first electrode contacts are placed on the resistive layer to define a first detection area in the sensitive area between the first electrode contacts, and wherein the second electrode contacts are placed partially in the sensitive area on the bottom surface of the body, the surfaces of the second electrodes in the sensitive area defining a second detection area that overlaps with the first detection area.
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