Invention Grant
- Patent Title: Detection system for nanometer scale topographic measurements of reflective surfaces
- Patent Title (中): 用于反射表面的纳米尺度地形测量的检测系统
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Application No.: US12074421Application Date: 2008-03-03
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Publication No.: US08384903B2Publication Date: 2013-02-26
- Inventor: Henrik K. Nielsen , Lionel Kuhlmann , Mark Nokes
- Applicant: Henrik K. Nielsen , Lionel Kuhlmann , Mark Nokes
- Applicant Address: US CA San Jose
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA San Jose
- Agency: Smyrski Law Group, A P.C.
- Main IPC: G01N21/55
- IPC: G01N21/55

Abstract:
A linear position array detector system is provided which imparts light energy to a surface of a specimen, such as a semiconductor wafer, receives light energy from the specimen surface and monitors deviation of the retro or reflected beam from that expected to map the contours on the specimen surface. The retro beam will, with ideal optical alignment, return along the same path as the incident beam if and only if the surface is normal to the beam. The system has a measurement device or sensor within the path of the retro or reflected beam to measure deviation of the retro beam from expected. The sensor is preferably a multiple element array of detector-diodes aligned in a linear fashion. A unique weighting and summing scheme is provided which increases the mechanical dynamic range while preserving sensitivity. The system further includes a bright field Nomarski Differential Interference Contrast sensor used to split the beam into two beams and for scanning in an orientation orthogonal to the orientation of the optical lever created by the system.
Public/Granted literature
- US20080225275A1 Detection system for nanometer scale topographic measurements of reflective surfaces Public/Granted day:2008-09-18
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