Invention Grant
US08385172B2 Method for recording critical patterns with different mark lengths onto optical storage medium and related controller thereof
有权
将具有不同标记长度的关键图案记录到光存储介质及其相关控制器上的方法
- Patent Title: Method for recording critical patterns with different mark lengths onto optical storage medium and related controller thereof
- Patent Title (中): 将具有不同标记长度的关键图案记录到光存储介质及其相关控制器上的方法
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Application No.: US13184566Application Date: 2011-07-17
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Publication No.: US08385172B2Publication Date: 2013-02-26
- Inventor: You-Wen Chang , Yi-Sung Chan
- Applicant: You-Wen Chang , Yi-Sung Chan
- Applicant Address: TW Science-Based Industrial Park, Hsin-Chu
- Assignee: Mediatek Inc.
- Current Assignee: Mediatek Inc.
- Current Assignee Address: TW Science-Based Industrial Park, Hsin-Chu
- Agent Winston Hsu; Scott Margo
- Main IPC: G11B7/00
- IPC: G11B7/00

Abstract:
An exemplary method for recording a first mark with a first length and a second mark with a second length onto an optical storage medium includes: when recording of the first mark requires a power transition from a first laser power level to a second laser power level, making a specific control signal have a logic transition from a low logic value to a high logic value and other control signals have no logic transition; and when recording of the second mark requires a power transition from a third laser power level to a fourth laser power level, making the specific control signal have the logic transition from the low logic value to the high logic value and other control signals have no logic transition.
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