Invention Grant
- Patent Title: Stamps with micrometer-and nanometer-scale features and methods of fabrication thereof
- Patent Title (中): 具有微米和纳米尺度特征的印模及其制造方法
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Application No.: US13286954Application Date: 2011-11-01
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Publication No.: US08387529B2Publication Date: 2013-03-05
- Inventor: Joseph S. Fragala , Cedric Loiret-Bernal , Hua Zhang , Raymond Roger Shile , Bjoern Rosner , Sylvain Cruchon-Dupeyrat
- Applicant: Joseph S. Fragala , Cedric Loiret-Bernal , Hua Zhang , Raymond Roger Shile , Bjoern Rosner , Sylvain Cruchon-Dupeyrat
- Applicant Address: US IL Skokie
- Assignee: NanoInk, Inc.
- Current Assignee: NanoInk, Inc.
- Current Assignee Address: US IL Skokie
- Agency: Foley & Lardner LLP
- Main IPC: B41C1/00
- IPC: B41C1/00
Abstract:
Stamps and methods of making stamps for applications in anti-counterfeiting and authentication. The stamps are relatively small in size and feature nanoscale and microscale identification regions and features. High throughput manufacturing and high resolution methods are used to make the stamps including electron beam lithography and optical lithography. Anti-fouling coatings can be applied.
Public/Granted literature
- US20120052415A1 STAMPS WITH MICROMETER-AND NANOMETER-SCALE FEATURES AND METHODS OF FABRICATION THEREOF Public/Granted day:2012-03-01
Information query
