Invention Grant
- Patent Title: Method and apparatus for cathodic arc ion plasma deposition
- Patent Title (中): 阴极电弧离子等离子体沉积的方法和装置
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Application No.: US12965054Application Date: 2010-12-10
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Publication No.: US08387561B2Publication Date: 2013-03-05
- Inventor: Scott Andrew Weaver , William Thomas Carter , Paul Mario Marruso
- Applicant: Scott Andrew Weaver , William Thomas Carter , Paul Mario Marruso
- Applicant Address: US NY Niskayuna
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Niskayuna
- Agent Penny A. Clarke
- Main IPC: C23C16/00
- IPC: C23C16/00
Abstract:
A method and apparatus for depositing a coating material on a surface of a substrate by an ion plasma deposition process using a hollow cathode is disclosed. The cathode may be a substantially cylindrical hollow cathode. A plasma arc is formed on the outer circumference of the cathode to remove coating material from the cathode, which is then deposited on a surface of a substrate. An internal arc drive magnet is contained within the hollow bore of the cathode and cooling is provided to the magnet during operation.
Public/Granted literature
- US20110073471A1 METHOD AND APPARATUS FOR CATHODIC ARC ION PLASMA DEPOSITION Public/Granted day:2011-03-31
Information query
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