Invention Grant
US08388219B2 Method for calibrating a pyrometer, method for determining the temperature of a semiconducting wafer and system for determining the temperature of a semiconducting wafer
有权
用于校准高温计的方法，用于确定半导体晶片的温度的方法和用于确定半导体晶片的温度的系统
- Patent Title: Method for calibrating a pyrometer, method for determining the temperature of a semiconducting wafer and system for determining the temperature of a semiconducting wafer
- Patent Title (中): 用于校准高温计的方法，用于确定半导体晶片的温度的方法和用于确定半导体晶片的温度的系统
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Application No.: US12777661Application Date: 2010-05-11
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Publication No.: US08388219B2Publication Date: 2013-03-05
- Inventor: Joerg-Thomas Zettler , Tobias Schenk , Steffen Uredat , Jens Zilian , Bernd Henninger , Marcello Binetti , Kolja Haberland
- Applicant: Joerg-Thomas Zettler , Tobias Schenk , Steffen Uredat , Jens Zilian , Bernd Henninger , Marcello Binetti , Kolja Haberland
- Applicant Address: DE Berlin
- Assignee: Laytec Aktiengesellschaft
- Current Assignee: Laytec Aktiengesellschaft
- Current Assignee Address: DE Berlin
- Agency: Novak Druce Connolly Bove + Quigg LLP
- Priority: DE102009003041 20090512; DE102009029859 20090618; EP09170604 20090917
- Main IPC: G01K15/00
- IPC: G01K15/00 ; G01K5/00 ; G01K5/08
Abstract:
A method for calibrating a pyrometer a temperature of a calibration sample is determined from the ratio of a first reflectance and a second reflectance and the pyrometer is calibrated by assigning the determined temperature of the calibration sample with a thermal radiation signal measured by the pyrometer.
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