Invention Grant
US08388786B2 Substrate-less pressure-sensitive adhesive sheet for protection of semiconductor wafer, method for grinding back side of semiconductor wafer using pressure-sensitive adhesive sheet, and method for producing pressure-sensitive adhesive sheet
有权
用于保护半导体晶片的无基板用粘合片,使用压敏粘合片研磨半导体晶片背面的方法,以及粘合片的制造方法
- Patent Title: Substrate-less pressure-sensitive adhesive sheet for protection of semiconductor wafer, method for grinding back side of semiconductor wafer using pressure-sensitive adhesive sheet, and method for producing pressure-sensitive adhesive sheet
- Patent Title (中): 用于保护半导体晶片的无基板用粘合片,使用压敏粘合片研磨半导体晶片背面的方法,以及粘合片的制造方法
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Application No.: US12720704Application Date: 2010-03-10
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Publication No.: US08388786B2Publication Date: 2013-03-05
- Inventor: Takashi Habu , Fumiteru Asai , Tomokazu Takahashi , Akinori Nishio , Toshio Shintani
- Applicant: Takashi Habu , Fumiteru Asai , Tomokazu Takahashi , Akinori Nishio , Toshio Shintani
- Applicant Address: JP Osaka
- Assignee: Nitto Denko Corporation
- Current Assignee: Nitto Denko Corporation
- Current Assignee Address: JP Osaka
- Agency: Sughrue Mion, PLLC
- Priority: JP2009-057644 20090311
- Main IPC: B32B37/00
- IPC: B32B37/00

Abstract:
The present invention provides a substrate-less pressure-sensitive adhesive sheet for protection of semiconductor wafer, which is to be stuck to a front surface of a semiconductor wafer in grinding a back surface of the semiconductor wafer, the pressure-sensitive adhesive sheet consisting of a pressure-sensitive adhesive layer, in which the pressure-sensitive adhesive layer is formed of a UV-curable pressure-sensitive adhesive containing a polymer composed mainly of an acrylic monomer polymerizable compound, the pressure-sensitive adhesive force of a surface of the pressure-sensitive adhesive layer to be stuck to the front surface of the semiconductor wafer is larger than the pressure-sensitive adhesive force of the opposite surface thereof, and the pressure-sensitive adhesive layer has an initial elastic modulus of from 0.01 MPa to 500 MPa.
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