In a method for treatment of a dispersed material in a plasma, in which a plasma-forming gas is introduced into a reaction chamber and ionized and a dispersed material is introduced into the reaction chamber and into the area of the plasma, treated under the action of the plasma, and subsequently removed from the area of the plasma, the introduction of the plasma-forming gas and the introduction of the dispersed material are performed independently of one another and from different directions. In an apparatus for treatment of a dispersed material in a plasma, which comprises a reaction chamber having a plasma generator, a first inlet for a plasma-forming gas, and a second inlet for the dispersed material, the second inlet is situated spatially separated in relation to the first inlet so that the dispersed material is conducted from the outside into the plasma.