Invention Grant
US08389202B2 Polymer, radiation-sensitive composition, monomer, and method of producing compound
有权
聚合物,辐射敏感组合物,单体和生产化合物的方法
- Patent Title: Polymer, radiation-sensitive composition, monomer, and method of producing compound
- Patent Title (中): 聚合物,辐射敏感组合物,单体和生产化合物的方法
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Application No.: US13427855Application Date: 2012-03-22
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Publication No.: US08389202B2Publication Date: 2013-03-05
- Inventor: Ken Maruyama , Toru Kimura
- Applicant: Ken Maruyama , Toru Kimura
- Applicant Address: JP Tokyo
- Assignee: JSR Corporation
- Current Assignee: JSR Corporation
- Current Assignee Address: JP Tokyo
- Agency: Ditthavong Mori & Steiner, P.C.
- Priority: JP2009-228360 20090930; JP2010-159097 20100713
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/039 ; C08F212/04 ; C08F220/10 ; C08F220/54 ; H01L21/027

Abstract:
A polymer includes a repeating unit shown by a general formula (1). R1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group. R2 represents a substituted or unsubstituted aryl group having 6 to 22 carbon atoms. Y represents a carbon atom. X represents —X1Z1X2— which is an atomic group which forms a cyclic structure including a heteroatom together with Y. Z1 represents —O—, —S—, —CO—, —COO—, —SO—, or —SO2—. Each of X1 and X2 individually represents a single bond, a methylene group, or an alkylene group having 2 to 25 carbon atoms. Each of X1 and X2 is unsubstituted or substituted with a substituent, and optionally a carbon atom included in X1 and a carbon atom included in X2 are bonded via a divalent group.
Public/Granted literature
- US20120178024A1 POLYMER, RADIATION-SENSITIVE COMPOSITION, MONOMER, AND METHOD OF PRODUCING COMPOUND Public/Granted day:2012-07-12
Information query
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