Invention Grant
- Patent Title: Method of producing a thin film photovoltaic system, and a thin film photovoltaic system
- Patent Title (中): 制造薄膜光伏系统的方法和薄膜光伏系统
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Application No.: US12701061Application Date: 2010-02-05
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Publication No.: US08389318B2Publication Date: 2013-03-05
- Inventor: Dieter Ostermann
- Applicant: Dieter Ostermann
- Applicant Address: DE Schonefeld/Waltersdorf
- Assignee: Zylum Beteiligungsgesellschaft mbH & Co. Patente II KG
- Current Assignee: Zylum Beteiligungsgesellschaft mbH & Co. Patente II KG
- Current Assignee Address: DE Schonefeld/Waltersdorf
- Agency: Panitch Schwarze Belisario & Nadel LLP
- Priority: DE102009007908 20090206
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method of producing a thin film photovoltaic system (2) having a two-dimensional metal chalcogenide compound semiconductor layer (7) as an absorber of sunlight and a metal layer (8) applied to the metal chalcogenide compound semiconductor layer is provided, wherein the metal chalcogenide compound semiconductor layer (7) and the metal layer (8) form a Schottky contact at their contact face. The method is characterized in that the metal chalcogenide compound semiconductor layer (7) is produced by applying a dispersion containing nanoscale particles having a diameter of about 3 nm to about 30 nm to a transparent substrate material (12), wherein the layer thickness of the metal chalcogenide compound semiconductor layer (7) applied to the substrate material ranges from about 150 nm to about 2500 nm.
Public/Granted literature
- US20100200047A1 METHOD OF PRODUCING A THIN FILM PHOTOVOLTAIC SYSTEM, AND A THIN FILM PHOTOVOLTAIC SYSTEM Public/Granted day:2010-08-12
Information query
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