Invention Grant
US08389375B2 Memory cell formed using a recess and methods for forming the same
有权
使用凹部形成的记忆单元及其形成方法
- Patent Title: Memory cell formed using a recess and methods for forming the same
- Patent Title (中): 使用凹部形成的记忆单元及其形成方法
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Application No.: US12703907Application Date: 2010-02-11
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Publication No.: US08389375B2Publication Date: 2013-03-05
- Inventor: Steven Maxwell
- Applicant: Steven Maxwell
- Applicant Address: US CA Milpitas
- Assignee: SanDisk 3D LLC
- Current Assignee: SanDisk 3D LLC
- Current Assignee Address: US CA Milpitas
- Agency: Dugan & Dugan, PC
- Main IPC: H01L29/93
- IPC: H01L29/93 ; G11C11/21

Abstract:
In a first aspect, a method of forming a memory cell is provided, the method including: (1) forming a pillar above a substrate, the pillar comprising a steering element and a metal hardmask layer; (2) selectively removing the metal hardmask layer to create a void; and (3) forming a carbon-based switching material within the void. Numerous other aspects are provided.
Public/Granted literature
- US20110193042A1 MEMORY CELL FORMED USING A RECESS AND METHODS FOR FORMING THE SAME Public/Granted day:2011-08-11
Information query
IPC分类: