Invention Grant
- Patent Title: Siloxane-based resin composition
- Patent Title (中): 硅氧烷树脂组合物
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Application No.: US12864832Application Date: 2008-05-27
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Publication No.: US08389649B2Publication Date: 2013-03-05
- Inventor: Mitsuhito Suwa , Hirokazu Iimori
- Applicant: Mitsuhito Suwa , Hirokazu Iimori
- Applicant Address: JP Tokyo
- Assignee: Toray Industries, Inc.
- Current Assignee: Toray Industries, Inc.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2008-015904 20080128
- International Application: PCT/JP2008/059689 WO 20080527
- International Announcement: WO2009/096050 WO 20090806
- Main IPC: C08L83/08
- IPC: C08L83/08
Abstract:
The present invention is a siloxane-based resin composition including a siloxane-based resin and an imidosilane compound having a specific structure. Moreover, the present invention is a siloxane-based resin composition including a siloxane-based resin which is a reactive product to be obtained by hydrolyzing an alkoxysilane compound and an imidosilane compound having a specific structure and then making the resulting hydrolysate undergo a condensation reaction. According to the present invention, it is possible to form a cured film excellent in adhesion.
Public/Granted literature
- US20100316953A1 SILOXANE-BASED RESIN COMPOSITION Public/Granted day:2010-12-16
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