Invention Grant
- Patent Title: Metal trace fabrication for optical element
- Patent Title (中): 光学元件的金属轨迹制造
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Application No.: US12909488Application Date: 2010-10-21
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Publication No.: US08389851B2Publication Date: 2013-03-05
- Inventor: Hing Wah Chan , Harold Ackler , Scott E. Solberg , John S. Fitch , David K. Fork , David G. Duff , Michael C. Weisberg
- Applicant: Hing Wah Chan , Harold Ackler , Scott E. Solberg , John S. Fitch , David K. Fork , David G. Duff , Michael C. Weisberg
- Applicant Address: US CA Palo Alto US CA Mountain View
- Assignee: Palo Alto Research Center Incorporated,SolFocus, Inc.
- Current Assignee: Palo Alto Research Center Incorporated,SolFocus, Inc.
- Current Assignee Address: US CA Palo Alto US CA Mountain View
- Agency: Bever, Hoffman & Harms, LLP
- Agent Patrick T. Bever
- Main IPC: H01L31/042
- IPC: H01L31/042

Abstract:
A system may include an optical element including a surface defining a recess, conductive material disposed within the recess, and a solder mask disposed over a portion of the conductive material. The solder mask may define an aperture through which light from the optical element may pass. Some aspects provide creation of an optical element including a surface defining a recess, deposition of conductive material on the surface such that a portion of the deposited conductive material is disposed within the recess, and substantial planarization of the surface to expose the portion of the conductive material disposed within the recess.
Public/Granted literature
- US20110031211A1 Metal Trace Fabrication For Optical Element Public/Granted day:2011-02-10
Information query
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