Invention Grant
- Patent Title: CMP pad dressers
- Patent Title (中): CMP抛光垫修整器
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Application No.: US12267172Application Date: 2008-11-07
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Publication No.: US08393938B2Publication Date: 2013-03-12
- Inventor: Chien-Min Sung
- Applicant: Chien-Min Sung
- Agency: Thorpe North & Western LLP
- Main IPC: B24B55/00
- IPC: B24B55/00

Abstract:
An abrasive tool includes an assembly of tool precursors. At least one of the tool precursors has a continuous polycrystalline diamond, polycrystalline cubic boron nitride, or ceramic material cutting element formed into a blade shape. The abrasive tool can additionally include a setting material, which is configured to attach the tool precursors and form a single mass. The selection, arrangement, and setting of the tool precursors can result in an abrasive tool having a predetermined cutting configuration. Methods for forming such an abrasive tool are also disclosed.
Public/Granted literature
- US20090123705A1 CMP Pad Dressers Public/Granted day:2009-05-14
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