Invention Grant
- Patent Title: Ultra-pure air system for nano wafer environment
- Patent Title (中): 用于纳米晶圆环境的超纯空气系统
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Application No.: US12112385Application Date: 2008-04-30
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Publication No.: US08394156B2Publication Date: 2013-03-12
- Inventor: Tzu-Sou Chuang , James Jeng-Jyi Hwang
- Applicant: Tzu-Sou Chuang , James Jeng-Jyi Hwang
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Duane Morris LLP
- Main IPC: B01D46/00
- IPC: B01D46/00

Abstract:
In one embodiment, an air filtration system includes a first ventilation path connected between at least one external air supply and a clean room. The first ventilation path is configured to direct air from the at least one external air supply to the clean room. A second ventilation path is connected to the clean room. The second ventilation path is configured to recirculate air in the clean room. A third ventilation path, separate from the first path, is connected between the at least one external air supply and a tool environment disposed within the clean room. The third ventilation path includes an ultra-pure air filtration unit disposed between the outdoor air supply and the tool environment. The ultra-pure air filtration unit includes a compressor and a dryer.
Public/Granted literature
- US20090275278A1 ULTRA-PURE AIR SYSTEM FOR NANO WAFER ENVIRONMENT Public/Granted day:2009-11-05
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