Invention Grant
- Patent Title: Method of forming nanostructures
- Patent Title (中): 形成纳米结构的方法
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Application No.: US12974404Application Date: 2010-12-21
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Publication No.: US08394224B2Publication Date: 2013-03-12
- Inventor: Fahhad H. Alharbi , John D. Bass , Ho-Cheol Kim , Robert D. Miller
- Applicant: Fahhad H. Alharbi , John D. Bass , Ho-Cheol Kim , Robert D. Miller
- Applicant Address: US NY Armonk SA Riyadh
- Assignee: International Business Machines Corporation,King Abdulaziz City for Science and Technology
- Current Assignee: International Business Machines Corporation,King Abdulaziz City for Science and Technology
- Current Assignee Address: US NY Armonk SA Riyadh
- Agent Daniel E. Johnson
- Main IPC: B32B27/00
- IPC: B32B27/00 ; B29C33/52

Abstract:
Layered nanostructures are constructed by imprinting material with a mold, while selectively modifying and removing a portion of the mold. The mold, which includes a pattern of features, is modified so that the portion of the mold that includes the features is made chemically and/or physically distinct from the rest of the mold. That portion of the mold that includes the features is retained while the rest of the mold is removed. The retained portion of the mold provides mechanical support for any adjoining layer or layers.
Public/Granted literature
- US20120152448A1 METHOD OF FORMING NANOSTRUCTURES Public/Granted day:2012-06-21
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