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US08394282B2 Adaptive nanotopography sculpting 有权
自适应纳米成像雕刻

Adaptive nanotopography sculpting
Abstract:
Adaptive imprint planarization provides a surface having desired shape characteristics. Generally, topography of a first surface is mapped to provide a density map. The density map is evaluated to provide a drop pattern for dispensing polymerizable material on the first surface. The polymerizable material is solidified and etched to provide a second surface having the desired shape characteristics. Additionally, adaptive imprint planarization compensates for parasitic effects of the imprinting process.
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