Invention Grant
- Patent Title: Adaptive nanotopography sculpting
- Patent Title (中): 自适应纳米成像雕刻
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Application No.: US12479200Application Date: 2009-06-05
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Publication No.: US08394282B2Publication Date: 2013-03-12
- Inventor: Avinash Panga , Sidlgata V. Sreenivasan
- Applicant: Avinash Panga , Sidlgata V. Sreenivasan
- Applicant Address: US TX Austin
- Assignee: Board of Regents, The University of Texas System
- Current Assignee: Board of Regents, The University of Texas System
- Current Assignee Address: US TX Austin
- Agent Cameron A. King
- Main IPC: C23F1/00
- IPC: C23F1/00

Abstract:
Adaptive imprint planarization provides a surface having desired shape characteristics. Generally, topography of a first surface is mapped to provide a density map. The density map is evaluated to provide a drop pattern for dispensing polymerizable material on the first surface. The polymerizable material is solidified and etched to provide a second surface having the desired shape characteristics. Additionally, adaptive imprint planarization compensates for parasitic effects of the imprinting process.
Public/Granted literature
- US20100012622A1 Adaptive Nanotopography Sculpting Public/Granted day:2010-01-21
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