Invention Grant
- Patent Title: Helical substituted polyacetylene structure, method for producing the same, device structure, ion transport film and gas separation film
- Patent Title (中): 螺旋取代聚乙炔结构，其制造方法，装置结构，离子传输膜和气体分离膜
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Application No.: US12041526Application Date: 2008-03-03
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Publication No.: US08394506B2Publication Date: 2013-03-12
- Inventor: Takeyuki Sone , Akira Kuriyama , Otto Albrecht , Koji Yano
- Applicant: Takeyuki Sone , Akira Kuriyama , Otto Albrecht , Koji Yano
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2007-060936 20070309
- Main IPC: C08F10/14
- IPC: C08F10/14 ; B32B9/04 ; B32B37/00
Abstract:
A helical substituted polyacetylene structure including a substrate and a substituted polyacetylene with a periodic main chain having a helical periodic structure, wherein the substituted polyacetylene is disposed inclined on the surface of the substrate with the inclination angle between the main helical axis of the substituted polyacetylene and the surface of the substrate falling in a range of 60° or more and 90° or less. A device structure in which a first electrode, the substituted polyacetylene with the periodic main chain having a helical periodic structure and a second electrode are sequentially disposed on a substrate.
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