Invention Grant
US08394508B2 Plated article having metal thin film formed by electroless plating
有权
具有通过无电镀形成的金属薄膜的电镀制品
- Patent Title: Plated article having metal thin film formed by electroless plating
- Patent Title (中): 具有通过无电镀形成的金属薄膜的电镀制品
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Application No.: US12311208Application Date: 2008-07-18
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Publication No.: US08394508B2Publication Date: 2013-03-12
- Inventor: Atsushi Yabe , Junichi Ito , Yoshiyuki Hisumi , Junnosuke Sekiguchi , Toru Imori
- Applicant: Atsushi Yabe , Junichi Ito , Yoshiyuki Hisumi , Junnosuke Sekiguchi , Toru Imori
- Applicant Address: JP Tokyo
- Assignee: Nippon Mining & Metals Co., Ltd.
- Current Assignee: Nippon Mining & Metals Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Flynn, Thiel, Boutell & Tanis, P.C.
- Priority: JP2007-200143 20070731
- International Application: PCT/JP2008/063023 WO 20080718
- International Announcement: WO2009/016979 WO 20090205
- Main IPC: B32B15/04
- IPC: B32B15/04 ; B32B15/20

Abstract:
A plated article has an alloy thin film formed on a substrate and having a catalytically active metal (A) for electroless plating and a metal (B) capable of undergoing displacement plating with a metal ion contained in an electroless plating solution, and a metal thin film formed on the alloy thin film by electroless displacement and reduction plating. The alloy thin film of the catalytically active metal (A) and the metal (B) capable of displacement plating has a composition comprising 5 at % to 40 at % of the metal (A). The metal thin film formed by electroless displacement and reduction plating is a metal thin film having a thickness no greater than 10 nm and a resistivity no greater than 10 μΩ·cm. Preferably, the metal (B) has a barrier function with respect to a metal of the metal thin film.
Public/Granted literature
- US20100003539A1 Plated article having metal thin film formed by electroless plating, and manufacturing method thereof Public/Granted day:2010-01-07
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