Invention Grant
US08394658B2 Methods of using a silicon nanoparticle fluid to control in situ a set of dopant diffusion profiles
有权
使用硅纳米颗粒流体原位控制一组掺杂剂扩散分布的方法
- Patent Title: Methods of using a silicon nanoparticle fluid to control in situ a set of dopant diffusion profiles
- Patent Title (中): 使用硅纳米颗粒流体原位控制一组掺杂剂扩散分布的方法
-
Application No.: US13238252Application Date: 2011-09-21
-
Publication No.: US08394658B2Publication Date: 2013-03-12
- Inventor: Giuseppe Scardera , Dmitry Poplavskyy , Michael Burrows , Sunil Shah
- Applicant: Giuseppe Scardera , Dmitry Poplavskyy , Michael Burrows , Sunil Shah
- Applicant Address: US CA Sunnyvale
- Assignee: Innovalight, Inc.
- Current Assignee: Innovalight, Inc.
- Current Assignee Address: US CA Sunnyvale
- Agency: Foley & Lardner LLP
- Main IPC: H01L21/22
- IPC: H01L21/22 ; H01L20/22
Abstract:
Disclosed are methods of forming multi-doped junctions, which utilize a nanoparticle ink to form an ink pattern on a surface of a substrate. From the ink pattern, a densified film ink pattern can be formed. The disclosed methods may allow in situ controlling of dopant diffusion profiles.
Public/Granted literature
- US20120052665A1 METHODS OF USING A SILICON NANOPARTICLE FLUID TO CONTROL IN SITU A SET OF DOPANT DIFFUSION PROFILES Public/Granted day:2012-03-01
Information query
IPC分类:
