Invention Grant
- Patent Title: Free-standing two-sided device fabrication
- Patent Title (中): 独立的双面设备制造
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Application No.: US12742081Application Date: 2008-11-07
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Publication No.: US08394660B2Publication Date: 2013-03-12
- Inventor: Samuel Kim , Babak Amirparviz
- Applicant: Samuel Kim , Babak Amirparviz
- Applicant Address: US WA Seattle
- Assignee: University of Washington its Center for Commercialization
- Current Assignee: University of Washington its Center for Commercialization
- Current Assignee Address: US WA Seattle
- Agency: Christensen O'Connor Johnson Kindness PLLC
- International Application: PCT/US2008/082827 WO 20081107
- International Announcement: WO2009/062055 WO 20090514
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
Devices having features deposited on two sides of a device substrate and methods for making the same. The devices are useful, for example, as the components in a macroelectronic system. In a preferred embodiment, the devices are photosensors having a plurality of electrodes patterned on a first side of the device and an electromagnetic interference filter patterned on a second side of the device. The method facilitates the fabrication of two-sided devices through the use of an immobilizing layer deposited on top of devices patterned on a first side of a device substrate; flipping the device substrate; processing the second side of the device substrate to produce patterned features on the second side of the device substrate; and releasing the devices having patterned elements on two sides of each device.
Public/Granted literature
- US20110012217A1 FREE-STANDING TWO-SIDED DEVICE FABRICATION Public/Granted day:2011-01-20
Information query
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