Invention Grant
US08394699B2 Memory arrays and methods of fabricating memory arrays 有权
存储器阵列和制造存储器阵列的方法

Memory arrays and methods of fabricating memory arrays
Abstract:
A memory array includes a plurality of memory cells formed on a semiconductor substrate. Individual of the memory cells include first and second field effect transistors respectively comprising a gate, a channel region, and a pair of source/drain regions. The gates of the first and second field effect transistors are hard wired together. A conductive data line is hard wired to two of the source/drain regions. A charge storage device is hard wired to at least one of the source/drain regions other than the two. Other aspects and implementations are contemplated, including methods of fabricating memory arrays.
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