Invention Grant
US08394727B1 High density selective deposition of carbon nanotubes onto a substrate
有权
碳纳米管在基片上的高密度选择性沉积
- Patent Title: High density selective deposition of carbon nanotubes onto a substrate
- Patent Title (中): 碳纳米管在基片上的高密度选择性沉积
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Application No.: US13588382Application Date: 2012-08-17
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Publication No.: US08394727B1Publication Date: 2013-03-12
- Inventor: Ali Afzali-Ardakani , Hongsik Park , George S. Tulevski
- Applicant: Ali Afzali-Ardakani , Hongsik Park , George S. Tulevski
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Cantor Colburn LLP
- Agent Vazken Alexanian
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L51/40 ; H01L21/31 ; H01L21/469

Abstract:
Methods for selectively placing carbon nanotubes on a substrate surface by using functionalized carbon nanotubes having an organic compound that is covalently bonded to such carbon nanotubes. The organic compound comprises at least two functional groups, the first of which is capable of forming covalent bonds with carbon nanotubes, and the second of which is capable of selectively bonding metal oxides. Such functionalized carbon nanotubes are contacted with a substrate surface that has at least one portion containing a metal oxide. The second functional group of the organic compound selectively bonds to the metal oxide, so as to selectively place the functionalized carbon nanotubes on the at least one portion of the substrate surface that comprises the metal oxide.
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