Invention Grant
- Patent Title: Method for manufacturing porous structure and method for forming pattern
- Patent Title (中): 制造多孔结构的方法及其形成方法
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Application No.: US13278904Application Date: 2011-10-21
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Publication No.: US08394877B2Publication Date: 2013-03-12
- Inventor: Koji Asakawa , Toshiro Hiraoka , Yoshihiro Akasaka , Yasuyuki Hotta
- Applicant: Koji Asakawa , Toshiro Hiraoka , Yoshihiro Akasaka , Yasuyuki Hotta
- Applicant Address: JP Kawasaki-shi
- Assignee: Kabushika Kaisha Toshiba
- Current Assignee: Kabushika Kaisha Toshiba
- Current Assignee Address: JP Kawasaki-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP11-159479 19990607; JP11-262326 19990916; JP2000-169263 20000606
- Main IPC: C08K5/07
- IPC: C08K5/07 ; C08K5/101 ; C08F220/06

Abstract:
A pattern forming material contains a block copolymer or graft copolymer and forms a structure having micro polymer phases, in which, with respect to at least two polymer chains among polymer chains constituting the block copolymer or graft copolymer, the ratio between N/(Nc−No) values of monomer units constituting respective polymer chains is 1.4 or more, where N represents total number of atoms in the monomer unit, Nc represents the number of carbon atoms in the monomer unit, No represents the number of oxygen atoms in the monomer unit.
Public/Granted literature
- US20120041121A1 METHOD FOR MANUFACTURING POROUS STRUCTURE AND METHOD FOR FORMING PATTERN Public/Granted day:2012-02-16
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