Invention Grant
- Patent Title: Laser irradiation apparatus and laser irradiation method
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Application No.: US11919748Application Date: 2006-04-26
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Publication No.: US08395084B2Publication Date: 2013-03-12
- Inventor: Koichiro Tanaka
- Applicant: Koichiro Tanaka
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office, P.C.
- Agent Eric J. Robinson
- Priority: JP2005-133788 20050502
- International Application: PCT/JP2006/309191 WO 20060426
- International Announcement: WO2006/118312 WO 20061109
- Main IPC: B23K26/06
- IPC: B23K26/06 ; B23K26/00

Abstract:
A laser beam having homogeneous intensity distribution is delivered without causing interference stripes of a laser to appear on an irradiation surface. A laser beam emitted from a laser oscillator passes through a diffractive optical element so that the intensity distribution thereof is homogenized. The beam emitted from the diffractive optical element then passes through a slit so that low-intensity end portions in a major-axis direction of the beam are blocked. Subsequently, the beam passes through a projecting lens and a condensing lens, so that an image of the slit is projected onto the irradiation surface. The projecting lens is provided so that the slit and the irradiation surface are conjugated. Thus, the irradiation surface can be irradiated with the laser having homogeneous intensity while preventing the diffraction by the slit.
Public/Granted literature
- US20090127477A1 Laser irradiation apparatus and laser irradiation method Public/Granted day:2009-05-21
Information query
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