Invention Grant
- Patent Title: Visible-region light measuring instrument and visible-region light measuring instrument manufacturing method
- Patent Title (中): 可见光区域测光仪和可见光测量仪器制造方法
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Application No.: US12561119Application Date: 2009-09-16
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Publication No.: US08395121B2Publication Date: 2013-03-12
- Inventor: Tadashi Chiba
- Applicant: Tadashi Chiba
- Applicant Address: JP Tokyo
- Assignee: Oki Semiconductor Co., Ltd.
- Current Assignee: Oki Semiconductor Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Taft Stettinius & Hollister LLP
- Priority: JP2008-243078 20080922
- Main IPC: G01J5/02
- IPC: G01J5/02

Abstract:
There is provided a visible-region light measuring instrument including: a first photodiode and a second photodiode. At least one of the first photodiode and the second photodiode comprises plural photodiodes, when the first photodiode comprises a first plural photodiodes, the visible-region light measuring instrument has first fuses that control connections between the first plural photodiodes and at least one of the first node and the first power supply node. When the second photodiode comprises a second plural photodiodes, the visible-region light measuring instrument has second fuses that control connections between the second plural photodiodes and at least one of the first node and the second power supply node.
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