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US08395195B2 Bottom-notched SiGe FinFET formation using condensation 有权
底部缺口SiGe使用冷凝的FinFET形成

Bottom-notched SiGe FinFET formation using condensation
Abstract:
An integrated circuit structure includes a substrate and a germanium-containing semiconductor fin over the substrate. The germanium-containing semiconductor fin has an upper portion having a first width, and a neck region under the upper portion and having a second width smaller than the first width.
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