Invention Grant
- Patent Title: Group nitride bipolar transistor
- Patent Title (中): 组氮化物双极晶体管
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Application No.: US13124872Application Date: 2009-10-16
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Publication No.: US08395237B2Publication Date: 2013-03-12
- Inventor: Yuji Ando , Hironobu Miyamoto , Tatsuo Nakayama , Yasuhiro Okamoto , Takashi Inoue , Kazuki Ota
- Applicant: Yuji Ando , Hironobu Miyamoto , Tatsuo Nakayama , Yasuhiro Okamoto , Takashi Inoue , Kazuki Ota
- Applicant Address: JP Tokyo
- Assignee: NEC Corporation
- Current Assignee: NEC Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2008-270883 20081021
- International Application: PCT/JP2009/067907 WO 20091016
- International Announcement: WO2010/047280 WO 20100429
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/737

Abstract:
A bipolar transistor includes: a substrate; a collector and a base layer with a p-conductive-type, an emitter layer with an n-conductive-type. The collector layer is formed above the substrate and includes a first nitride semiconductor. The base layer with the p-conductive-type is formed on the collector layer and includes a second nit ride semiconductor. The emitter layer with the n-conductive-type is formed on the base layer and includes a third nitride semiconductor. The collector layer, the base layer and the emitter layer are formed so that crystal growing directions with respect to a surface of the substrate are in parallel to a [0001] direction of the substrate. The first nitride semiconductor includes: InycAlxcGa1-xc-ycN (0≦xc≦1, 0≦yc≦1, 0
Public/Granted literature
- US20110241075A1 BIPOLAR TRANSISTOR Public/Granted day:2011-10-06
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