Invention Grant
- Patent Title: Semiconductor device and manufacturing method therefor
- Patent Title (中): 半导体装置及其制造方法
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Application No.: US12726824Application Date: 2010-03-18
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Publication No.: US08395248B2Publication Date: 2013-03-12
- Inventor: Yoshiaki Nozaki
- Applicant: Yoshiaki Nozaki
- Applicant Address: JP Osaka
- Assignee: Sharp Kabushiki Kaisha
- Current Assignee: Sharp Kabushiki Kaisha
- Current Assignee Address: JP Osaka
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2009-084913 20090331
- Main IPC: H01L23/495
- IPC: H01L23/495

Abstract:
A semiconductor device includes a lead frame 1 having a first lead 6, a second lead 7 and a third lead 8. A power transistor 2 is placed on the first lead 6, and the power transistor 2 is connected to the first lead 6. The power transistor 2 has a drain electrode on one side opposite to a first lead 6 side, and this drain electrode is connected to a Cu chip 3 on the power transistor 2. The Cu chip 3 is connected to the second lead 7 via Al wires 4. As a result, during wire bonding of the Al wires 4, it becomes possible to absorb shocks due to wire bonding by the Cu chip 3, or disperse pressure due to wire bonding by the Cu chip 3, or diffuse heat due to wire bonding by the Cu chip 3.
Public/Granted literature
- US20100244213A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR Public/Granted day:2010-09-30
Information query
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