Invention Grant
US08395726B2 Optical element manufacturing method, optical element exposure device, optical element, lighting optical device, display device, and electronic apparatus
有权
光学元件制造方法,光学元件曝光装置,光学元件,照明光学装置,显示装置和电子装置
- Patent Title: Optical element manufacturing method, optical element exposure device, optical element, lighting optical device, display device, and electronic apparatus
- Patent Title (中): 光学元件制造方法,光学元件曝光装置,光学元件,照明光学装置,显示装置和电子装置
-
Application No.: US12890730Application Date: 2010-09-27
-
Publication No.: US08395726B2Publication Date: 2013-03-12
- Inventor: Kunihiro Shiota , Koji Mimura
- Applicant: Kunihiro Shiota , Koji Mimura
- Applicant Address: JP Kanagawa
- Assignee: NLT Technologies, Ltd.
- Current Assignee: NLT Technologies, Ltd.
- Current Assignee Address: JP Kanagawa
- Agency: Young & Thompson
- Priority: JP2009-224458 20090929; JP2010-174504 20100803
- Main IPC: G02F1/1335
- IPC: G02F1/1335 ; F21V11/02 ; G02B27/00

Abstract:
Provided is an optical element manufacturing method that is capable of forming various kinds of shapes and capable of achieving sophisticated functions, improved yields, and cost reductions. The method includes: a step that applies a transparent photosensitive resin on a transparent substrate with light-shielding patterns provided thereon; a step that forms transparent layers by performing patterning through irradiating exposure light of an arbitrary amount on the transparent photosensitive resin via the transparent substrate with the light-shielding patterns provided thereon; a step that forms light absorption layers by filling a black curable resin between the transparent layers; and an irradiation step that irradiates the exposure light in an oblique direction to the surface of the transparent substrate where the light-shielding patterns are formed in a state where the transparent substrate is being bent.
Public/Granted literature
Information query
IPC分类: