Invention Grant
- Patent Title: Sensor, a table and lithographic apparatus
- Patent Title (中): 传感器,桌子和光刻设备
-
Application No.: US12818358Application Date: 2010-06-18
-
Publication No.: US08395772B2Publication Date: 2013-03-12
- Inventor: Henricus Wilhelmus Maria Van Buel , Jeroen Thomas Broekhuijse , Vitaliy Prosyentsov , Sandra Van Der Graaf , Nina Vladimirovna Dziomkina
- Applicant: Henricus Wilhelmus Maria Van Buel , Jeroen Thomas Broekhuijse , Vitaliy Prosyentsov , Sandra Van Der Graaf , Nina Vladimirovna Dziomkina
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
A sensor for an immersion system is disclosed. The sensor comprises: a sensing device, a transparent layer and an opaque patterning layer. The sensing device is configured to sense a property of a beam of radiation. The transparent layer is configured to allow the passage of a beam of radiation therethrough. The transparent layer covers the sensing device. The opaque patterning layer is configured to impart a pattern to the beam of radiation. In the patterning layer is an opening in which is located an infilling material. The infilling material is transparent to the beam of radiation and has a similar refractive index to that of the transparent layer.
Public/Granted literature
- US20100321695A1 SENSOR, A TABLE AND LITHOGRAPHIC APPARATUS Public/Granted day:2010-12-23
Information query