Invention Grant
- Patent Title: Non-transitory storage medium for rinsing or developing sequence
- Patent Title (中): 用于冲洗或开发顺序的非瞬时储存介质
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Application No.: US13117483Application Date: 2011-05-27
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Publication No.: US08398320B2Publication Date: 2013-03-19
- Inventor: Yasuhiro Takaki , Osamu Miyahara , Keiichi Tanaka , Shinya Wakamizu , Takashi Terada
- Applicant: Yasuhiro Takaki , Osamu Miyahara , Keiichi Tanaka , Shinya Wakamizu , Takashi Terada
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2004-118233 20040413
- Main IPC: G03B5/00
- IPC: G03B5/00 ; G03C5/18

Abstract:
A non-transitory storage medium stores software for performing a rinsing process on a substrate, after a developing process is performed on a light-exposed pattern disposed thereon. The sequence includes throwing off a developing solution from the substrate after development; supplying a water-based cleaning liquid onto the substrate; supplying a surfactant-containing rinsing liquid onto the substrate to replace liquid remaining on the substrate with the surfactant-containing rinsing liquid; and rotating the substrate to expand and throw off the surfactant-containing rinsing liquid on the substrate.
Public/Granted literature
- US20110229120A1 RINSING METHOD AND DEVELOPING METHOD Public/Granted day:2011-09-22
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