Invention Grant
- Patent Title: Method and apparatuses for reducing porogen accumulation from a UV-cure chamber
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Application No.: US12132559Application Date: 2008-06-03
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Publication No.: US08398816B1Publication Date: 2013-03-19
- Inventor: Lisa Gytri , Jeff Gordon , James Lee , Carmen Balderrama , Joseph Brett Harris
- Applicant: Lisa Gytri , Jeff Gordon , James Lee , Carmen Balderrama , Joseph Brett Harris
- Applicant Address: US CA Fremont
- Assignee: Novellus Systems, Inc.
- Current Assignee: Novellus Systems, Inc.
- Current Assignee Address: US CA Fremont
- Agency: Weaver Austin Villeneuve & Sampson LLP
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23F1/00 ; H01L21/306

Abstract:
Porogen accumulation in a UV-cure chamber is reduced by removing outgassed porogen through a heated outlet while purge gas is flowed across a window through which a wafer is exposed to UV light. A purge ring having specific major and minor exhaust to inlet area ratios may be partially made of flame polished quartz to improve flow dynamics. The reduction in porogen accumulation allows more wafers to be processed between chamber cleans, thus improving throughput and cost.
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