Invention Grant
- Patent Title: Dual anodization surface treatment
- Patent Title (中): 双阳极氧化表面处理
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Application No.: US12692433Application Date: 2010-01-22
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Publication No.: US08398841B2Publication Date: 2013-03-19
- Inventor: Jivan K. Khosla
- Applicant: Jivan K. Khosla
- Applicant Address: US CA Cupertino
- Assignee: Apple Inc.
- Current Assignee: Apple Inc.
- Current Assignee Address: US CA Cupertino
- Agency: Womble Carlyle Sandridge & Rice LLP
- Main IPC: C25D11/02
- IPC: C25D11/02 ; C25D11/12

Abstract:
A metal surface treated to have two anodized layers or regions may be used in electronic devices. The surface treatment may include performing a first anodization process to create a first anodized layer, removing the first anodized layer at select locations, and performing a second anodization process to create a second anodized layer at the select locations. The first and second anodized regions may have different decorative properties, such as color, and different structural properties, such as degree of abrasion resistance. One of the anodization processes may be hard anodization and the other may be standard anodization.
Public/Granted literature
- US20110017602A1 Dual Anodization Surface Treatment Public/Granted day:2011-01-27
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